Chemical vapor deposition (CVD)
化學氣相沉積為半導體製程中一種用來產生高純度、高效能的固態材料的重要技術。
CVD製程廣泛應用於半導體產業，用來成長不同形式的材料，包括單晶、多晶、非晶和磊晶材料。
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